同步辐射实验方法在研究材料的结构和物性上具有独特的优势，然而，要实现同步辐射原位高温条件，尤其温度高于2 000 K以上，对很多实验方法来说还是一个挑战。激光加热方法可以实现快速、微区的极端高温条件，已经成为高温物性研究的重要工具。上海同步辐射光源在极端高温研究领域，例如高熵合金、涡轮叶片、航空材料等还欠缺相关的原位高温条件，因此，研制了一种便携式连续激光加热装置，利用光谱仪获得样品的热辐射谱，并通过黑体辐射方法拟合出样品的温度梯度和温度稳定性。利用该装置成功实现真空环境中钨片的快速熔化（熔点约3 695 K），并在上海同步辐射光源表面衍射线站获得了1 608 K原位条件下的MoS₂和CTAB-MoS₂材料X射线衍射图谱。本工作所研制的激光加热方法拓展了上海光源在极端条件下的实验能力，为极端高温条件下的材料物性研究提供了重要手段。

In a single nanoscale device, surface plasmon polaritons (SPPs) have potential to match the different length scales associated with photonics and electronics. In this Letter, we propose an accurate design of a plasmonic metasurface Luneburg lens (PMLL) accommodating SPPs. The simulations indicate that the full width at half-maximum is 0.42 μm, and the focus efficiency is 78%. The characters of a PMLL have robustness to manufacturing errors. The PMLL is applied in a 10 μm long compact coupler model, which couples the SPPs to the 40 nm wide output waveguide. The couple efficiency is higher than that of a conventional taper coupler in a broad bandwidth. The design is compatible with standard lithography technology.

High-resolution lens-coupled indirect X-ray scintillator imagers are required by many imaging applications. However, the severe weakening of image details prevents its further performance improvement. Through our research, this image degradation is attributed to the broadband loss of the high-spatial-frequency information caused by the high refractive index. A technique known as high-spatial-frequency spectrum enhanced reconstruction is thus proposed to retrieve this information. A two-dimensional high-density array is covered on the scintillator’s exit surface and operates as an encoder based on which high-frequency information can be shifted to the low-frequency region to improve the signal-to-noise ratio. The experimental results show that the middle-high-frequency signal intensities can be increased by an order of magnitude or more, up to ～50 times. Therefore, the image details can be effectively enhanced to break through the performance bottleneck of such widely used X-ray imagers for synchrotron radiation facilities or tabletop X-ray tubes.

Achromatic Talbot lithography (ATL) with high resolution has been demonstrated to be an excellent technique for large area periodic nano-fabrication. In this work, the uniformity of pattern distribution in ATL was studied in detail. Two ATL transmission masks with ～50% duty cycle in a square lattice were illuminated by a spatial coherent broadband extreme ultraviolet beam with a relative bandwidth of 2.38%. Nonuniform dot size distribution was observed by experiments and finite-difference time-domain simulations. The sum of the two kinds of diffraction patterns, with different lattice directions (45° rotated) and different intensity distributions, results in the final nonuniform pattern distribution.

We describe the design and capabilities of the x-ray excited optical luminescence (XEOL) technique at the scanning transmission x-ray microscopy beamline (BL08U1A) of the Shanghai Synchrotron Radiation Facility. The detection system is a functional expanding of the original end station, making full use of its precision positioning stages. The simultaneous collection of XEOL and total electron yield spectra is realized using homemade software when the excitation energy is scanned. The setup is validated by the 2D near-edge x-ray absorption spectroscopy (NEXAFS) XEOL mapping across the O K-edge of a nanostructured ZnO sample. The ability to detect the signal of very weak light-emitting material is verified by using TiO2 nanopowder.